Traceable emissivity measurements in RTP using room temperature reflectometry

By: Hunter, A.; Adams, B.; Ramanujam, R.
Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on RTP
Volume , Issue , 23-26 Sept. 2003 Page(s): 85 - 88
Digital Object Identifier 10.1109/RTP.2003.1249127
Summary:

The design of an integrating reflectometer specific to the optical and spectral requirements of rapid thermal processing (RTP) is discussed. We report reflectance measurements of various materials. These measurements are correlated to in-situ emittance measurements recorded during rapid thermal processing. We also present the design of an optimized emissometer for an RTP chamber. We propose a means for correlating room temperature reflectance measurements to emittance standards for RTP.

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